| Water system |
Usage |
Function |
Effect |
| Ultra-pure water for cleaning
LSI chips and LCDs |
Removal of dissolved
oxygen |
Prevention of
formation of oxide layer |
| Removal of dissolved
carbon dioxide |
Load reduction
for polisher |
| Carbon dioxide
dissolution |
Adjustment of
electric conductivity |
| Feed water,
air-conditioning water |
Removal of dissolved
oxygen |
Prevention of
pipe corrosion |
| Water
used in food processing |
Removal of dissolved
air |
Inprovement of volume uniformity in container filling process, prevention of deterioration caused by oxidization of
components |
| Removal of minute
amounts of volatile organic matter |
Enhancement
of safety of food and beverage products |
| Water
for ultrasonic cleaning |
Removal of dissolved
oxygen |
Prevention of
rust in metal components |
| Removal of dissolved
air |
Enhancement
and homogenization of sonic cleansing action |
| Water used in
analyzing apparatus |
Defoaming |
Improvement
of accuracy of microanalysis |
| Solvents system |
Solution for
semiconductor production,
Ink |
Removal of microbubbles
Removal of dissolved oxygan |
Prevention of
pattern defects Improvement of print accuracy |