|
Water system |
Usage |
Function |
Effect |
|
Ultra-pure water for cleaning LSI chips and LCDs |
Removal of dissolved oxygen |
Prevention of formation of oxide layer |
|
Removal of dissolved carbon dioxide |
Load reduction for polisher |
|
Carbon dioxide dissolution |
Adjustment of electric conductivity |
|
Feed water, air-conditioning water |
Removal of dissolved oxygen |
Prevention of pipe corrosion |
|
Water used in food processing |
Removal of dissolved air |
Inprovement of volume uniformity in container filling process, prevention of deterioration caused by oxidization of components |
|
Water for ultrasonic cleaning |
Removal of dissolved oxygen |
Prevention of rust in metal components |
|
Removal of dissolved air |
Enhancement and homogenization of sonic cleansing action |
|
Water used in analyzing apparatus |
Defoaming |
Improvement of accuracy of microanalysis |
|
Solvents system |
Solution for semiconductor production,
Ink |
Removal of microbubbles
Removal of dissolved oxygan |
Prevention of pattern defects
Improvement of print accuracy |